La liste de tous les mélanges

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Appellation N°CAS Proportion Appellation Les pictogrammes CMR
Avantama N-31
71-36-3
78-92-2
18282-10-5
50%
50%
2%
Butanol
2-Butanol
oxyde d'étain
Non
Non
Non
2% Bis Solution
7732-18-5
110-26-9
98%
2%
H2O
N,N′-Methylenebis(acrylamide)
Non
Non
40% Acrylamide Solution
7732-18-5
79-06-1
60%
40%
H2O
acrylamide
Non
Oui
7311 - JELTONET PLUS
64742-49-0
106-97-8
74-98-6
8042-47-5
109-87-5
45%
25%
15%
10%
5%
iso-Hexane
Butane
propane
Inland TW
diméthoxyméthane
Non
Non
Non
Non
Non
AA1110
108-65-6
70%
propylène glycol monométhyl ether acetate
Oui
Acide chlorhydrique 37%
7732-18-5
7647-01-0
63%
37%
H2O
Chlorure d’Hydrogène
Non
Non
Acide chlorhydrique 37%-HCl solution aqueuse 37%-hydrochloric acid 37%
7732-18-5
7647-01-0
63%
37%
H2O
Chlorure d’Hydrogène
Non
Non
acide fluorhydrique 1%, hydrofluoric acid , HF solution 1%
7732-18-5
7664-39-3
99%
1%
H2O
fluorure d'hydrogène
Non
Non
acide fluorhydrique 5%, hydrofluoric acid , HF solution 5%
7732-18-5
7664-39-3
95%
5%
H2O
fluorure d'hydrogène
Non
Non
Acide fluorhydrique 50% , hydrofluoric acid , HF solution 50%
7664-39-3
7732-18-5
50%
50%
fluorure d'hydrogène
H2O
Non
Non
acide nitrique 69,5%-HNO3-nitric acid 69,5%
7697-37-2
7732-18-5
69%
30%
Acide nitrique
H2O
Non
Non
acide sulfurique 96%- H2SO4 96%-concentrated sulfuric acid
7664-93-9
7732-18-5
96%
4%
acide sulfurique pur
H2O
Non
Non
Adhesion Promoter mr-APS1
34590-94-8
1760-24-3
35%
5%
(2-Méthoxyméthylethoxy)propanol
N-[3-(Trimethoxysilyl)propyl]ethylenediamine
Non
Non
Adhesive DP-620NS
101-68-8
25686-28-6
68424-09-9
59952-43-1
45%
25%
25%
3%
4,4'-diphenylmethane diisocyanate
poly(diphenylmethane-4,4'-diisocyanate)
diphenylmethanediisocyanate prepolymer
diphenylmethanediisocyanate prepolymer
Oui
Non
Oui
Non
AgNO3 0.005N
7732-18-5
7761-88-8
97%
2%
H2O
Nitrate d’argent
Non
Non
AgNO3 0.1M
7732-18-5
7761-88-8
97%
2%
H2O
Nitrate d’argent
Non
Non
Air sec
7727-37-9
7782-44-7
80%
20%
Azote
Oxygène
Non
Non
Aluminum standard for AAS
7732-18-5
7446-70-0
99.9%
0.1%
H2O
Chlorure d’aluminium anhydre
Non
Non
Ammoniaque 29%-NH4OH 29%-ammonium hydroxide 29%
7732-18-5
7664-41-7
71%
29%
H2O
Amoniac ALNAT 8
Non
Non
AMONIL MMS 4
119-61-9
90%
Benzophénone
Non
Antimony Tin Oxide solution in water
7732-18-5
18282-10-5
70%
20%
H2O
oxyde d'étain
Non
Non
Antinomy Tin Oxide Nanopowder
18282-10-5
90%
oxyde d'étain
Non
AP-3000
107-98-2
7732-18-5
1589-47-5
98%
1%
0.5%
1-Methoxy-2-propanol
H2O
Methoxy 2 propanol
Non
Non
Non
AP-903
67-63-0
99%
isopropanol - propane-2ol - IPA - isopropyl alcohol
Non
AR-PC 5090.02
67-63-0
30%
isopropanol - propane-2ol - IPA - isopropyl alcohol
Non
ARALDITE 2021
80-62-6
79-41-4
128-37-0
50%
10%
3%
Méthacrylate de méthyle
Acide méthacrylique
2,6-Di-tert-butyl-4-méthyl-phénol
Non
Non
Non
ARALDITE 2022
80-62-6
110-16-7
60%
10%
Méthacrylate de méthyle
maleic acid
Non
Non
ARALDITE GY 282
9003-36-5
80%
formaldéhyde polymer
Oui
Argent chimique
1336-21-6
5949-29-1
7761-88-8
10%
2%
1%
Ammonia solution 28%
Citrique acid monohydrate
Nitrate d’argent
Non
Non
Non
AZ 100 REMOVER
34590-94-8
78-96-6
90%
30%
(2-Méthoxyméthylethoxy)propanol
1-aminopropan-2-ol, isopropanolamine
Non
Non
AZ 400 K Developer
1310-58-3
20786-60-1
5%
5%
KOH solide
borate de potassium
Non
Non
AZ 4999
67-64-1
108-65-6
90%
10%
Acetone, 2-propanone, Diméthylcétone
propylène glycol monométhyl ether acetate
Non
Oui
AZ BARLi-II-200
687-47-8
107-98-2
80%
10%
ethyl lactate
1-Methoxy-2-propanol
Non
Non
AZ Developer
6834-92-0
7601-54-9
5%
2%
Métasilicate de disodium
Sodium Phosphate
Non
Non
Azote hydrogene
7727-37-9
1333-74-0
90%
5%
Azote
Hydrogène
Non
Non
BE 7-1 Buffered Oxide Etchant BOE acide fluorhydrique tamponé
7732-18-5
12125-01-8
1341-49-7
7664-39-3
62%
17%
17%
2%
H2O
Ammonium fluoride
Ammonium hydrogen difluoride
fluorure d'hydrogène
Non
Non
Non
Non
Black Resin
72869-86-4
162881-26-7
75%
1%
Diurethane
Irgacure 819
Non
Non
BM-T145-A
7732-18-5
7664-93-9
7758-99-8
93%
6%
1%
H2O
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
Non
BM-T145-B
7664-38-2
7758-99-8
3%
1%
acide phosphorique
Sulfate de cuivre(II) pentahydrate
Non
Non
BM-T145-C
7758-99-8
5%
Sulfate de cuivre(II) pentahydrate
Non
BM-VMS
7758-99-8
7664-93-9
21%
4%
Sulfate de cuivre(II) pentahydrate
acide sulfurique pur
Non
Non
Brightener n°6
1310-73-2
1327-53-3
1%
1%
NaOH
Arsenic trioxide
Non
Oui
buffered oxide etchant
12125-01-8
50%
Ammonium fluoride
Non
Capstone FS-3100
123-91-1
1%
1,4-Dioxane
Oui
Castable Resin
41637-38-1
75980-60-8
90%
1%
ethoxylate dimethacrylate
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Oui
Chip Quik Lead Free Solder Paste
8050-09-7
8000-41-7
110-16-7
7440-50-8
7440-69-9
45%
5%
4%
1%
1%
colophane
terpineol
maleic acid
Cuivre
bismuth
Non
Non
Non
Non
Non
chromium etchant TechniEtch Cr01-solution de gravure du chrome
7732-18-5
16774-21-3
7601-90-3
65%
25%
10%
H2O
Ammonium cerium(IV) nitrate
Acide perchlorique
Non
Non
Non
Clear Resin
72869-86-4
75980-60-8
75%
1%
Diurethane
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Oui
Copper Standard for AAS
7697-37-2
5%
Acide nitrique
Non
Crème à braser SIRIUS 1 LF
7440-31-5
7440-22-4
7440-50-8
96%
3%
1%
Etain
argent
Cuivre
Non
Non
Non
CU-BRITE BU2HA
7664-93-9
7758-99-8
15%
10%
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
Cu-BRITE BU2HA-A
7664-93-9
7758-99-8
15%
10%
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
Cu-BRITE BU2HA-B
7664-93-9
7758-99-8
15%
10%
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
Cuivre standard AAS
7697-37-2
3%
Acide nitrique
Non
Cyclotene 4026
000108-67-8
50%
Mesitylene
Non
DEK SMT STENCIL CLEANER
7732-18-5
124-68-5
90%
5%
H2O
2-amino-2-methylpropanol
Non
Non
Developer AR 600-546
628-63-7
99%
AmylAcetate, AR 600-546, ZED-N50
Non
Developer mr-D 4000/ 100
584-08-7
2%
Carbonate de potassium
Non
DF-1000 series
27610-48-6
872-50-4
35%
10%
6-glycidyloxynapht-1-yloxyméthyloxirane
N-méthyl-2-pyrrolidone, Remover PG
Oui
Oui
DL260
64-17-5
1%
Ethanol-ethyl alcohol
Non
Draft Resin
41637-38-1
72869-86-4
162881-26-7
70%
29%
1%
ethoxylate dimethacrylate
Diurethane
Irgacure 819
Non
Non
Non
DS3000
64-17-5
0.1%
Ethanol-ethyl alcohol
Non
Durable Resin
72869-86-4
65%
Diurethane
Non
DURABOND M-121HP MED DEV EPOXY
68082-29-1
112-57-2
112-24-3
75%
15%
10%
FattyAcidsC18-UnsatdDimeOligomericReactionProductsWithTall-OilFattyAcidsAndTriethylenetetramine
3,6,9-triazaundecamethylenediamine, tetraethylenepentamine
3,6-diazaoctanethylenediamin, triethylenetetramine
Non
Non
Non
Dynasolve 220
27176-87-0
20%
Dodecylbenzenesulfonic acid solution
Non
E-Beam Resist AR-P 6200 series - CSAR 62
100-66-3
95%
Anisole
Non
E4-3017
107-98-2
2530-83-8
99%
1%
1-Methoxy-2-propanol
(3-Glycidyloxypropyl)trimethoxysilane
Non
Non
EA-11E5
2386-87-0
157479-55-5
77-58-7
70%
10%
2%
3,4-Epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate
Siloxanes and Silicones, di-Me, 3-hydroxypropyl Me, ethers with polyethylene-polypropylene glycol mo
Dibutyltin dilaurate
Non
Non
Oui
eau oxygénée - peroxyde d'hydrogène-H2O2 30%-hydrogen peroxide 30%
7732-18-5
7722-84-1
70%
30%
H2O
peroxyde d'hydrogène
Non
Non
Elastic Resin
ELECTROFUGE 200 - ND
115-10-6
1330-20-7
141-78-6
78-93-3
556-67-2
50%
10%
10%
10%
1%
dimethyl ether
Xylène
Ethyle Acetate
2-Butanone_MethylEthylKetone_MEK
octaméthylcyclotétrasiloxane
Non
Non
Non
Non
Oui
EN-11E6-1
150-76-5
1%
mequinol, 4-methoxyphenol, hydroquinone monomethyl ether
Non
EP 601
25068-38-6
9046-10-0
70%
50%
reaction product: bisphenol-A-(epichlorhydrin), epoxy resin (number average molecular weight ≤ 700
POLYOXYPROPYLENEDIAMINE
Non
Non
EP 601 part A
25068-38-6
28064-14-4
50%
50%
reaction product: bisphenol-A-(epichlorhydrin), epoxy resin (number average molecular weight ≤ 700
BISPHENOL F-EPICHLORHYDRIN_28064-14-4_28064-14-4_Poly[(phenyl glycidyl ether)-co-formaldehyde]
Non
Non
EP 601 part B
9046-10-0
90%
POLYOXYPROPYLENEDIAMINE
Non
Epithas LEC-19-M5
75-59-2
7664-38-2
10%
1%
Tetramethylammonium hydroxide
acide phosphorique
Non
Non
Epithas MCT-14
7664-93-9
18%
acide sulfurique pur
Non
EPITHAS MCT-22-A
107-21-1
25%
ethylene glycol
Non
Epithas MCT-22-M
1310-73-2
1314-13-2
50%
10%
NaOH
oxyde de zinc
Non
Non
Epithas NPR-18-A
7786-81-4
50%
Nickel sulfate
Oui
Epithas NPR-18-B
Epithas NPR-18-C
1310-73-2
25%
NaOH
Non
Epithas NPR-18-D
7732-18-5
20%
H2O
Non
Epithas NPR-18-M
110-15-6
515-98-0
142-47-2
20%
20%
10%
Succinic acid RPE - For analysis
Ammonium Lactate
Acide Glutamique Monosodique
Non
Non
Non
Epithas-MCL-16
1310-73-2
1330-43-4
5%
5%
NaOH
Disodium tetraborate
Non
Oui
EPO-TEK 301-2 Part A
1675-54-3
90%
Bisphenol A resin
Non
EPO-TEK 301-2 Part B
1675-54-3
90%
Bisphenol A resin
Non
EPO-TEK 353 NDT
9003-36-5
80%
formaldéhyde polymer
Oui
EPO-TEK H20E
9003-36-5
60%
formaldéhyde polymer
Oui
EPO-TEK H70E
9003-36-5
50%
formaldéhyde polymer
Oui
EPO-TEK H70E-2
9003-36-5
50%
formaldéhyde polymer
Oui
EPO-TEK H70E-4
9003-36-5
50%
formaldéhyde polymer
Oui
Epotek 353NDT
9003-36-5
80%
formaldéhyde polymer
Oui
Equipment-Cleaner TE1 TECH grade
107-98-2
100-51-6
68439-46-3
68955-19-1
15%
10%
10%
10%
1-Methoxy-2-propanol
Alcool benzylique
Ethoxylated alcohols
Sodium Coco Sulfate 95%
Non
Non
Non
Non
Etain à froid
53408-94-9
62-56-6
75-75-2
10%
10%
10%
Méthanesulfonate d'étain(II)
Thiourée
Acide méthanesulfonique
Non
Oui
Non
Éthoxyde de titane(IV)
3087-36-3
546-68-9
75%
25%
Titanium(4+) ethanolate
Titanium isopropylate RE - Pure
Non
Non
F2CAEH
1351374-94-1
90%
DTS(PTTh2)2
Non
FILS DE SOUDURE RESINEUX SANS PLOMB : ETAIN - ARGENT - CUIVRE
7440-31-5
7440-22-4
124-04-9
7440-50-8
95%
3%
1%
1%
Etain
argent
acide adipique
Cuivre
Non
Non
Non
Non
flexible Resin
72869-86-4
75980-60-8
70%
1%
Diurethane
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Oui
Flux remover
110-82-7
107-98-2
67-63-0
60%
20%
20%
Cyclohexane
1-Methoxy-2-propanol
isopropanol - propane-2ol - IPA - isopropyl alcohol
Non
Non
Non
Flux-Off Water Soluble
67-63-0
106-97-8
109-60-4
70%
15%
15%
isopropanol - propane-2ol - IPA - isopropyl alcohol
Butane
Acétate de propyle
Non
Non
Non
formalin solution
7732-18-5
50-00-0
67-56-1
92%
5%
3%
H2O
formaldéhyde à....%
Methanol
Non
Oui
Non
GA-3012
2530-83-8
99%
(3-Glycidyloxypropyl)trimethoxysilane
Non
GALDEN HT LOW-BOILING
69991-67-9
99%
FOMBLIN YL AC
Non
GG-1110
28906-96-9
96-48-0
108-32-7
45%
45%
5%
Formaldehyde, polymer
γ-Butyrolactone
Propylene carbonate
Non
Non
Non
GG-1120
96-48-0
108-65-6
60%
5%
γ-Butyrolactone
propylène glycol monométhyl ether acetate
Non
Oui
Gobright TCU-41-B
14808-79-8
25%
sulfate
Non
Gobright-TCU-41-A
1310-73-2
1%
NaOH
Non
Gold Etch TFAC
127-68-4
151-50-8
557-21-1
1310-58-3
35%
35%
20%
10%
Sodium n-nitrobenzenesulfonate
Cyanure de potassium
Zinc Cyanide
KOH solide
Non
Non
Non
Non
Gold etchant ACI2-solution pour gravure de l'or-iode dans solution d'iodure de potassium
7732-18-5
7681-11-0
7553-56-2
91%
7%
2%
H2O
Iodure de potassium
Iode
Non
Non
Non
Grey Resin
72869-86-4
75%
Diurethane
Non
Grey ResinPro
72869-86-4
75%
Diurethane
Non
H2O2 30%
7722-84-1
50%
peroxyde d'hydrogène
Non
H70E4
9003-36-5
60%
formaldéhyde polymer
Oui
HD 4110
872-50-4
67-56-1
60%
10%
N-méthyl-2-pyrrolidone, Remover PG
Methanol
Oui
Non
HD 8820
96-48-0
108-65-6
60%
40%
γ-Butyrolactone
propylène glycol monométhyl ether acetate
Non
Oui
HD-8940
96-48-0
108-65-6
872-50-4
50%
10%
1%
γ-Butyrolactone
propylène glycol monométhyl ether acetate
N-méthyl-2-pyrrolidone, Remover PG
Non
Oui
Oui
HFE-7100 perfluorobutylmethylether-nonafluorobutyl methyl ether
163702-07-6
163702-08-7
50%
50%
Methyl Nonaflurorobutyl Ether
nonafluoroisobutyl methylether
Non
Non
Hitemp V1
40220-08-4
72869-86-4
45%
10%
Tris[2-(acryloyloxy)ethyl] isocyanurate
Diurethane
Non
Non
HSQ
108-10-1
137125-44-1
108-88-3
77%
20%
3%
4-Methyl-2-Pentanone, MIBK
POLY(HYDRIDOSILSESQUIOXANE)-T8, HYDRIDE SUBSTITUTED
Toluene
Non
Non
Oui
Hydroxyde de potassium 40%
7732-18-5
1310-58-3
60%
40%
H2O
KOH solide
Non
Non
INTERVIA BP DEVELOPER
75-59-2
3%
Tetramethylammonium hydroxide
Non
INTERVIA™ BPN-65 A PHOTORESIST
71868-10-5
1%
2-méthyl-1-(4-méthylthiophényl)-2-morpholinopropan-1-one
Oui
iode, solution KI/I2
7681-11-0
7553-56-2
3%
2%
Iodure de potassium
Iode
Non
Non
IP-Dip
3524-68-3
161182-73-6
72009-86-0
60%
20%
20%
2-(Hydroxymethyl)-2-[[(1- oxoallyl)oxy]methyl]-1,3-propanediyl
9H-fluorene-9,9-diylbis(4,1-phenyleneoxyethane-2,1-diyl)-bisacrylate
Biphenyl-2-ol, ethoxylated, esters with acrylic acid
Non
Non
Non
IP-G 780 Photoresist
78-93-3
3524-68-3
70%
30%
2-Butanone_MethylEthylKetone_MEK
2-(Hydroxymethyl)-2-[[(1- oxoallyl)oxy]methyl]-1,3-propanediyl
Non
Non
IP-L 780 Photoresist
3524-68-3
90%
2-(Hydroxymethyl)-2-[[(1- oxoallyl)oxy]methyl]-1,3-propanediyl
Non
IP-S Photoresist
96-48-0
90-93-7
2%
1%
γ-Butyrolactone
4,4‘-Bis-(diethylamino)-benzophenon
Non
Non
Iron Standard for AAS
7697-37-2
5%
Acide nitrique
Non
JADE/ESSILOR
108-32-7
3109-63-5
70%
30%
Propylene carbonate
Tetra-N-Butylammonium Hexafluorophosphate
Non
Non
JCU BM-T145-A
7664-93-9
7758-99-8
6%
1%
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
JCU BM-T145-B
7664-93-9
7758-99-8
3%
1%
acide sulfurique pur
Sulfate de cuivre(II) pentahydrate
Non
Non
JCU BM-T145-C
7758-99-8
7664-93-9
5%
1%
Sulfate de cuivre(II) pentahydrate
acide sulfurique pur
Non
Non
JCU BM-VMS
7758-99-8
7664-93-9
21%
4%
Sulfate de cuivre(II) pentahydrate
acide sulfurique pur
Non
Non
JT-1015
108-65-6
15625-89-5
70657-70-4
40%
8%
1%
propylène glycol monométhyl ether acetate
1,1,1-Trihydroxymethylpropyltriacrylate
2-Methoxypropyl acetate, 2-Methoxy-1-propanol Acetate
Oui
Non
Oui
JT-1016
108-65-6
15625-89-5
70657-70-4
40%
10%
1%
propylène glycol monométhyl ether acetate
1,1,1-Trihydroxymethylpropyltriacrylate
2-Methoxypropyl acetate, 2-Methoxy-1-propanol Acetate
Oui
Non
Oui
JW-1112
687-47-8
110-43-0
67-56-1
35%
25%
1%
ethyl lactate
heptan-2-one, methyl amyl ketone
Methanol
Non
Non
Non
JW-2151
687-47-8
110-43-0
30%
20%
ethyl lactate
heptan-2-one, methyl amyl ketone
Non
Non
JW2151-v2
108-65-6
123-42-2
70657-70-4
50%
20%
1%
propylène glycol monométhyl ether acetate
4-hydroxy-4-methylpentan-2-one
2-Methoxypropyl acetate, 2-Methoxy-1-propanol Acetate
Oui
Non
Oui
Laque Argent (L-200n)
7440-22-4
67-64-1
40%
10%
argent
Acetone, 2-propanone, Diméthylcétone
Non
Non
laque argent L200N
7440-22-4
52125-53-8
67-64-1
141-78-6
50%
20%
5%
3%
argent
1,2-Propanediol, monoethyl ether
Acetone, 2-propanone, Diméthylcétone
Ethyle Acetate
Non
Non
Non
Non
LEAD FREE FLUX REMOVER
110-82-7
107-98-2
67-63-0
8028-48-6
110-54-3
68647-72-3
45%
20%
20%
10%
7%
3%
Cyclohexane
1-Methoxy-2-propanol
isopropanol - propane-2ol - IPA - isopropyl alcohol
Histolemon RS - For histology
hexane anhydre
Orange terpenes
Non
Non
Non
Non
Oui
Non
LIQUID FLUX
67-63-0
8050-09-7
112-34-5
64742-47-8
45%
35%
15%
5%
isopropanol - propane-2ol - IPA - isopropyl alcohol
colophane
Diethylene glycol butyl ether
Solvant ICP
Non
Non
Non
Non
LOCTITE 362 SN62 5C
7440-31-5
7439-92-1
8050-09-7
7440-22-4
65%
30%
3%
2%
Etain
plomb
colophane
argent
Non
Oui
Non
Non
LOCTITE 3D 3820 UCL
63225-53-6
42978-66-5
75980-60-8
818-61-1
50%
10%
1%
1%
Acrylate de 2- [[(butylamino)carbonyl]oxy]éthyle
TPGDA
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
2-hydroxyethyl acrylate
Non
Non
Oui
Non
Loctite Double Bubble A
28064-14-4
30499-70-8
50%
40%
BISPHENOL F-EPICHLORHYDRIN_28064-14-4_28064-14-4_Poly[(phenyl glycidyl ether)-co-formaldehyde]
Trimethylolpropane triglycidyl ether
Non
Non
Loctite Double Bubble B
90-72-2
123-68-2
10%
1%
tris (dimethylaminomethyl)phenol
Hexanoate d'allyle
Non
Non
LOCTITE DURABLE HIGH IMPACT 3870
63225-53-6
42978-66-5
818-61-1
30%
5%
1%
Acrylate de 2- [[(butylamino)carbonyl]oxy]éthyle
TPGDA
2-hydroxyethyl acrylate
Non
Non
Non
loctite LF 318 96SCAGS88.5V
7440-31-5
7440-22-4
8050-09-7
7440-50-8
80%
5%
5%
3%
Etain
argent
colophane
Cuivre
Non
Non
Non
Non
LOCTITE MP 218 SN62AGS89.5V
7440-31-5
7439-92-1
7440-22-4
8050-09-7
50%
40%
3%
3%
Etain
plomb
argent
colophane
Non
Oui
Non
Non
LOR A Series Resists
120-92-3
102322-80-5
107-98-2
65%
20%
15%
Cyclopentanone
Polyaliphatic imide copolymer
1-Methoxy-2-propanol
Non
Non
Non
LOR B Series Resists
120-92-3
102322-80-5
107-98-2
80%
10%
10%
Cyclopentanone
Polyaliphatic imide copolymer
1-Methoxy-2-propanol
Non
Non
Non
LTC 9505
96-48-0
60%
γ-Butyrolactone
Non
LUDOX TMA
7732-18-5
7631-86-9
55965-84-9
65%
34%
1%
H2O
Silica, amorphous
reaction mass of 5-chloro-2-methyl-2H-isothiazol-3-one and 2-methyl-2H-isothiazol-3-one (3:1)
Non
Non
Non
M-COPPER 85-A
50-00-0
5%
formaldéhyde à....%
Oui
M-COPPER 85-B
60-00-4
40%
EDTA, sel tétrasodique
Non
M-COPPER 85-C
1310-73-2
25%
NaOH
Non
M-COPPER 85-D
1310-73-2
25%
NaOH
Non
M-COPPER 85-G
67-56-1
366-18-7
5%
1%
Methanol
2,2'-DIPYRIDINE
Non
Non
ma-N 2403
108-10-1
120-92-3
45%
45%
4-Methyl-2-Pentanone, MIBK
Cyclopentanone
Non
Non
MACUPLEX j664
77-92-9
7718-54-9
25%
25%
Acide citrique anhydre
dichlorure de nickel
Non
Oui
MCC Primer 80/20
108-65-6
999-97-3
70657-70-4
74%
25%
1%
propylène glycol monométhyl ether acetate
Hexaméthyldisilazane
2-Methoxypropyl acetate, 2-Methoxy-1-propanol Acetate
Oui
Non
Oui
Metalon JS-B25HV
7440-22-4
107-21-1
9002-93-1
25%
15%
1%
argent
ethylene glycol
Triton X-100
Non
Non
Non
MICROFAB BRIGHTENER No. 7
6153-56-6
10102-45-1
5%
2%
Acide oxalique dihydrate
Thallium nitrate
Non
Non
MICROFAB DVF 200-B
7664-93-9
5%
acide sulfurique pur
Non
MICROFAB DVF 200-C
96-23-1
1%
1,3-dichloro-2-propanol
Oui
MICROFAB DVF 200-MU
54253-62-2
75-75-2
35%
5%
copper(II) methanesulfonate
Acide méthanesulfonique
Non
Non
MICROFAB HUE AU B
5064-31-3
1%
nitrilotriacétate de trisodium
Oui
MICROPOSIT(TM) MF(TM) -CD-26 Developer
7732-18-5
75-59-2
97%
3%
H2O
Tetramethylammonium hydroxide
Non
Non
Mould Release agent
7732-18-5
60%
H2O
Non
Nanostrenght EO
108-65-6
80%
propylène glycol monométhyl ether acetate
Oui
Nanostrength EO NL
108-65-6
70%
propylène glycol monométhyl ether acetate
Oui
NaOH 0.1M
7732-18-5
1310-73-2
96%
4%
H2O
NaOH
Non
Non
NaOH 1M
7732-18-5
1310-73-2
60%
40%
H2O
NaOH
Non
Non
NB Semiplate Ni 100
13770-89-3
1310-58-3
13462-88-9
50%
5%
5%
bis(sulfamidate) de nickel,ulfamate de nickel
KOH solide
nickel dibromide
Oui
Non
Oui
Negative photoresist AR-N 4340
108-65-6
1319-77-3
80%
1%
propylène glycol monométhyl ether acetate
cresol
Oui
Oui
NEUTRONEX 309 CONDUCTING SALT
7757-83-7
20%
NEUTRONEX 309 CONDUCTING SALT
Non
NI 100 ADD. Agent
1008-72-6
10%
Sodium 2-formylbenzenesulphonate
Non
NI 100 anode activator
13462-88-9
30%
nickel dibromide
Oui
Nitrate d argent Solution
7732-18-5
7761-88-8
77%
2%
H2O
Nitrate d’argent
Non
Non
NM-30ST
67-56-1
7631-86-9
70%
30%
Methanol
Silica, amorphous
Non
Non
NME-A2140Z
78-93-3
67-56-1
7732-18-5
53%
1%
1%
2-Butanone_MethylEthylKetone_MEK
Methanol
H2O
Non
Non
Non
NME-E6150P
7631-86-9
78-93-3
67-56-1
7732-18-5
50%
47%
1%
1%
Silica, amorphous
2-Butanone_MethylEthylKetone_MEK
Methanol
H2O
Non
Non
Non
Non
NPs Au 10 nm
7440-57-5
90%
Or
Non
OCON-193
8002-74-2
90%
Paraffine
Non
OCON-196
8002-74-2
90%
Paraffine
Non
OrmoClear® FX
33007-83-9
128-37-0
75980-60-8
84434-11-7
30%
1%
1%
1%
Trimethylolpropane tris(3- mercaptopropionate)
2,6-Di-tert-butyl-4-méthyl-phénol
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Ethyl phenyl(2,4,6-trimethylbenzoyl)phosphinate
Non
Non
Oui
Non
Ormocomp_HF_XX_XP
2358-84-1
162881-26-7
75980-60-8
30%
5%
5%
Di(ethylene glycol) dimethacrylate
Irgacure 819
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Non
Oui
Ormocomp®
15625-89-5
75980-60-8
35%
1%
1,1,1-Trihydroxymethylpropyltriacrylate
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Oui
OrmoPrime®08
2530-85-0
90%
3-(Trimethoxysilyl)propyl methacrylate
Non
OrmoStamp
15625-89-5
2358-84-1
75980-60-8
20%
20%
5%
1,1,1-Trihydroxymethylpropyltriacrylate
Di(ethylene glycol) dimethacrylate
Diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide
Non
Non
Oui
P-AA-903
67-63-0
7732-18-5
99%
1%
isopropanol - propane-2ol - IPA - isopropyl alcohol
H2O
Non
Non
Parylene Dimer DPX-C
PE410
7440-22-4
112-34-5
45%
15%
argent
Diethylene glycol butyl ether
Non
Non
PEPR 2400 PHOTORESIST
872-50-4
3%
N-méthyl-2-pyrrolidone, Remover PG
Oui
Perminex 2001
120-92-3
2530-83-8
50%
5%
Cyclopentanone
(3-Glycidyloxypropyl)trimethoxysilane
Non
Non
PF-2 - perfluoroalylpolyether - hexafluoropropen oxidised polymerised
69991-67-9
90%
FOMBLIN YL AC
Non
Phosphate Buffered Saline
7732-18-5
7447-40-7
7558-79-4
7647-14-5
7778-77-0
99%
1%
1%
1%
1%
H2O
Chlorure de potassium
Sodium Phosphate disodique
Chlorure de sodium
Potassium phosphate monobasic RPE - For analysis - ISO - ACS - Reag.Ph.Eur. - Reag.USP
Non
Non
Non
Non
Non
photoresist AZ 40XT-11D
108-65-6
45%
propylène glycol monométhyl ether acetate
Oui
photoresist AZ 4562
108-65-6
50%
propylène glycol monométhyl ether acetate
Oui
photoresist AZ 4999
108-65-6
10%
propylène glycol monométhyl ether acetate
Oui
photoresist AZ 5214
108-65-6
68510-93-0
60%
10%
propylène glycol monométhyl ether acetate
Acide 6-Diazo-5,6-dihydro- 5-oxo-, 1- Naphtalènesulfonique, ester avec le phényl(2,3,4- trihydroxy
Oui
Non
photoresist AZ ECI 3027
687-47-8
123-86-4
50%
10%
ethyl lactate
Acétate de n-butyle
Non
Non
photoresist AZ NLOF 2035
108-65-6
63%
propylène glycol monométhyl ether acetate
Oui
photoresist AZ40XT
108-65-6
45%
propylène glycol monométhyl ether acetate
Oui
photoresist JW-2151
110-43-0
20%
heptan-2-one, methyl amyl ketone
Non
photoresist S1805 G2
108-65-6
70%
propylène glycol monométhyl ether acetate
Oui
photoresist S1813 G2
108-65-6
1319-77-3
70%
1%
propylène glycol monométhyl ether acetate
cresol
Oui
Oui
photoresist SU8 séries3000
120-92-3
28906-96-9
9003-36-5
40%
40%
20%
Cyclopentanone
Formaldehyde, polymer
formaldéhyde polymer
Non
Non
Oui
Photoresist-Stripper SH5
107-98-2
100-51-6
68439-46-3
15%
10%
10%
1-Methoxy-2-propanol
Alcool benzylique
Ethoxylated alcohols
Non
Non
Non
Photoresist-Stripper SVD VLSI
100-51-6
68439-46-3
61788-90-7
7%
5%
3%
Alcool benzylique
Ethoxylated alcohols
Amines, coco alkyl dimethyl, oxides
Non
Non
Non
PI 2611
872-50-4
29319-22-0
60%
30%
N-méthyl-2-pyrrolidone, Remover PG
S-Biphenyldianhydride/p-Phenylenediamine
Oui
Oui
PMMA (solutions)
100-66-3
9011-14-7
95%
5%
Anisole
PMMA
Non
Non
Poly(ethylene glycol) diacrylate 250
26570-48-9
99%
Poly(ethylene glycol) diacrylate
Non
Poly(ethylene glycol) diacrylate 700
26570-48-9
99%
Poly(ethylene glycol) diacrylate
Non
POLYTEC EC 112 PART A
2425-79-8
10%
ETHER DIGLYCIDIQUE DU 1,4 BUTANEDIOL
Non
POLYTEC EC 112 PART B
288-32-4
25%
imidazole
Oui
POLYTEC EP 630 PART A
28064-14-4
2425-79-8
90%
10%
BISPHENOL F-EPICHLORHYDRIN_28064-14-4_28064-14-4_Poly[(phenyl glycidyl ether)-co-formaldehyde]
ETHER DIGLYCIDIQUE DU 1,4 BUTANEDIOL
Non
Non
POLYTEC EP 630 PART B
288-32-4
25%
imidazole
Oui
Popote
64-02-8
4524-95-2
540-67-0
120-32-1
42031-28-7
12%
5%
5%
0%
0%
tetrasodium ethylene diamine tetraacetate
2-methyl-2-azabicyclo[2.2.1]heptane
ethyl methyl ether
clorofène,hlorophène,2-benzyl-4-chlorophénol
trans-2-isopropyl-5-carboxy-1,3-dioxane
Non
Non
Non
Oui
Non
Potassium hydroxide solution
7732-18-5
1310-58-3
55%
45%
H2O
KOH solide
Non
Non
PriElex SU-8
120-92-3
108-65-6
28906-96-9
96-48-0
40%
30%
20%
10%
Cyclopentanone
propylène glycol monométhyl ether acetate
Formaldehyde, polymer
γ-Butyrolactone
Non
Oui
Non
Non
propylène glycol monométhyl ether acetate
108-65-6
35%
propylène glycol monométhyl ether acetate
Oui
PV410
34590-94-8
10%
(2-Méthoxyméthylethoxy)propanol
Non
QUICK SET EPOXY ADHESIVE
25068-38-6
28064-14-4
90%
10%
reaction product: bisphenol-A-(epichlorhydrin), epoxy resin (number average molecular weight ≤ 700
BISPHENOL F-EPICHLORHYDRIN_28064-14-4_28064-14-4_Poly[(phenyl glycidyl ether)-co-formaldehyde]
Non
Non
R-1400
7732-18-5
14808-60-7
7631-86-9
68037-59-2
77%
15%
5%
3%
H2O
Silica, crystalline (quartz)
Silica, amorphous
Dimethyl, Methylhydrogen Siloxane Copolymer
Non
Non
Non
Non
reflow oven cleaner
7732-18-5
124-68-5
80%
5%
H2O
2-amino-2-methylpropanol
Non
Non
refractive index liquid series A
90-11-9
20%
1-Bromonaphthalene
Non
Remover PG-NMP-N methyl pyrrolidone based photoresist remover
872-50-4
7732-18-5
98%
1%
N-méthyl-2-pyrrolidone, Remover PG
H2O
Oui
Non
révélateur PMMA
67-63-0
108-10-1
66%
33%
isopropanol - propane-2ol - IPA - isopropyl alcohol
4-Methyl-2-Pentanone, MIBK
Non
Non
Rigid 10K Resin
7631-86-9
72869-86-4
65%
25%
Silica, amorphous
Diurethane
Non
Non
Rigid 4000 Resin
72869-86-4
55%
Diurethane
Non
SAFEWASH - AQUEOUS FLUX REMOVER
141-43-5
34590-94-8
68439-46-3
10%
10%
10%
Éthanolamine
(2-Méthoxyméthylethoxy)propanol
Ethoxylated alcohols
Non
Non
Non
SC-303S
7732-18-5
25086-89-9
102-71-6
79-14-1
83%
10%
5%
2%
H2O
POLY(1-VINYLPYRROLIDONE-CO-VINYL ACETATE
Triéthanolamine, TS1
Acide glycolique, TS2
Non
Non
Non
Non
SHIPLEY BPR PHOTOSTRIPPER
872-50-4
107-21-1
50%
20%
N-méthyl-2-pyrrolidone, Remover PG
ethylene glycol
Oui
Non
SILICONE RTV, R-1600
22984-54-9
7631-86-9
96-29-7
20%
15%
1%
Methyltris(methylethylketoxmino)silane
Silica, amorphous
2-Butanone oxime
Oui
Non
Oui
Siloprene
77-58-7
78-10-4
50%
50%
Dibutyltin dilaurate
Tetraethyl orthosilicate
Oui
Non
Siloprenvernetzer K-11
77-58-7
78-10-4
45%
45%
Dibutyltin dilaurate
Tetraethyl orthosilicate
Oui
Non
Silver (Ag) Particles Water Dispersion
7732-18-5
7440-22-4
95%
5%
H2O
argent
Non
Non
Silver Dispersion
7440-22-4
0.25%
argent
Non
Solutions PMMA
100-66-3
9011-14-7
90%
10%
Anisole
PMMA
Non
Non
SPR 700-1.2
97-64-3
100-66-3
624-41-9
1319-77-3
65%
10%
5%
1%
ethyl lactate
Anisole
2-methyl buthyl acetate
cresol
Non
Non
Non
Oui
SS-1131
120-92-3
45%
Cyclopentanone
Non
Standard AAS Argent
7732-18-5
7697-37-2
7761-88-8
97%
2%
1%
H2O
Acide nitrique
Nitrate d’argent
Non
Non
Non
Standard AAS Arsenic
7732-18-5
7697-37-2
1327-53-3
96%
3%
1%
H2O
Acide nitrique
Arsenic trioxide
Non
Non
Oui
Standard AAS Calcium
7732-18-5
7647-01-0
10043-52-4
94%
5%
1%
H2O
Chlorure d’Hydrogène
Chlorure de calcium, CaCl2
Non
Non
Non
Standard AAS Cobalt
10026-22-9
1%
Cobalt (II) nitrate hexahydrate RS - For enviromental analysis - ACS
Oui
Standard AAS Etain
7647-01-0
7772-99-8
15%
1%
Chlorure d’Hydrogène
Tin(II)Chloride
Non
Non
Standard AAS Nickel
7732-18-5
7697-37-2
13138-45-9
13478-00-7
94%
5%
1%
1%
H2O
Acide nitrique
Nickel dinitrate
Nickel(II) nitrate hexahydrate
Non
Non
Oui
Oui
Standard AAS Or
7732-18-5
7647-01-0
16903-35-8
92%
7%
1%
H2O
Chlorure d’Hydrogène
Tetrachloroauric Acid
Non
Non
Non
Standard AAS Platine
7732-18-5
7647-01-0
92%
7%
H2O
Chlorure d’Hydrogène
Non
Non
Standard AAS Thallium
7697-37-2
10102-45-1
5%
1%
Acide nitrique
Thallium nitrate
Non
Non
SU-8 3000
28906-96-9
9003-36-5
40%
20%
Formaldehyde, polymer
formaldéhyde polymer
Non
Oui
SU-8 Developer
108-65-6
70657-70-4
99%
1%
propylène glycol monométhyl ether acetate
2-Methoxypropyl acetate, 2-Methoxy-1-propanol Acetate
Oui
Oui
SU8 2000
28906-96-9
108-32-7
109037-75-4
20%
2%
2%
Formaldehyde, polymer
Propylene carbonate
Triarylsulfonium hexfluoroantimonate salt
Non
Non
Non
SU8 photoresist GLM 2060
120-92-3
28906-96-9
108-32-7
70%
20%
5%
Cyclopentanone
Formaldehyde, polymer
Propylene carbonate
Non
Non
Non
Super glue plastic adhesive
7085-85-0
123-31-9
80%
1%
Cyanoacrylate d'éthyle
Hydroquinone
Non
Oui
SYLGARD™ 184 Silicone Elastomer Base
100-41-4
1%
Éthylbenzène
Non
TechniStrip® NF52
75-59-2
10%
Tetramethylammonium hydroxide
Non
TechniStrip® Ni555
34590-94-8
6153-56-6
90%
2%
(2-Méthoxyméthylethoxy)propanol
Acide oxalique dihydrate
Non
Non
TechniStrip® P1331
75-59-2
3%
Tetramethylammonium hydroxide
Non
Tétrabutanolate de titane
5593-70-4
546-68-9
100%
6%
Titanium(IV) butoxide
Titanium isopropylate RE - Pure
Non
Non
Thallium Standard for AAS
7697-37-2
10102-45-1
3%
1%
Acide nitrique
Thallium nitrate
Non
Non
Thermalcote I
1314-13-2
40%
oxyde de zinc
Non
Tough Resin
72869-86-4
75%
Diurethane
Non
TP-20PC
108-65-6
25%
propylène glycol monométhyl ether acetate
Oui
Turbidity 4000 NTU
100-97-0
10%
Hexaméthylènetétramine
Non
Vitralit 1672
2386-87-0
1675-54-3
2530-83-8
50%
10%
3%
3,4-Epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate
Bisphenol A resin
(3-Glycidyloxypropyl)trimethoxysilane
Non
Non
Non
Vitralit 1702
2680-03-7
2235-00-9
2399-48-6
42978-66-5
15%
10%
10%
2%
N,N-dimethylacrylamide
1-Vinylhexahydro-2H-azepin-2-one
Tetrahydrofurfuryl Acrylate
TPGDA
Non
Non
Non
Non
Vitralit 7041T
2399-48-6
2235-00-9
2680-03-7
25%
10%
10%
Tetrahydrofurfuryl Acrylate
1-Vinylhexahydro-2H-azepin-2-one
N,N-dimethylacrylamide
Non
Non
Non
XP Prielex SU-8 1.0
108-65-6
120-92-3
96-48-0
40%
40%
15%
propylène glycol monométhyl ether acetate
Cyclopentanone
γ-Butyrolactone
Oui
Non
Non
ZEP 520A
100-66-3
89%
Anisole
Non
Zirconium(IV) propoxide solution
23519-77-9
60%
Zirconium(IV) propoxide solution
Non